During the forecast period, the Dry Film Photoresist Market is forecast to rise from USD 4.13 billion in 2019 to USD 5.29 billion by 2027, delivering a CAGR of 3.1%. The major driving factor for the market is developments in technology that increase the use of nano devices.
Due to the increase in the implementation of photo-resistant technology and the increasing demand for the technology in the IC and semiconductor markets, the dry film photoresist market is expected to exhibit significant growth. The demand is helped by the growing need for nano devices. A photoresist is a light-sensitive material used to create the desired pattern to be imaged in the photoengraving or photolithography phase that is applied to a surface. It is used in semiconductors & ICs, printed circuit boards, LCDs, and others. The introduction of photoresist technology is driving the global market for dry film photoresist.
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Further key findings from the report suggest
Some major key players in the dry film photoresist market are:
Asahi Kasei (Japan), JSR Corporation (Japan), TOKYO OHKA KOGYO CO., LTD. (Japan), The Dow Chemical Company (U.S.), Shin-Etsu Chemical Co., Ltd. (Japan), Fujifilm Electronics Material Co., Ltd. (Japan), Sumitomo Chemicals Co., LTD. (Japan), Great Eastern Resins Industrial Co., Ltd. (Taiwan), Hitachi Chemical (Japan), and AZ Electronic Materials (Luxembourg).
For the purpose of this report, the market has been segmented on the basis of category, type, implementation, and region:
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Category Outlook (Revenue, USD Million; 2017-2027)
Type Outlook (Revenue, USD Million; 2017-2027)
Implementation Outlook (Revenue, USD Million; 2017-2027)
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Regional Outlook (Revenue, USD Million; 2017-2027)
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