The High-k And ALD/CVD Metal Precursors Market Research Report provides value chain analysis on the revenue for the forecast period 2016-2023 and estimates for each application in terms of market size, share, trend and growth. High-k refers to dielectric materials which uses ALD and CVD metal precursors technique and technology to fabricate materials used to produce semiconductor devices. ALD atomic layer deposition is a technique used to produce thin films of standard quality. CVD chemical vapor deposition is a process used to make excellent quality and high performance devices. ALD and CVD use gas and chemical deposition techniques respectively to produce excellent dielectric and semiconductor devices.
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ALD and CVD techniques are extensively used in various applications which include, semiconductor devices, microelectronics, LED dielectrics and in biomedical applications. Global high-k ALD/CVD metal precursors market is segmented on the basis of technology into capacitor, interconnect and high-k gates. Capacitor technology is the most extensively used technology due to its high performance and eminent applications in the electronic market.
Extensive use of ALD and CVD technology in the microelectronics field accompanied by growth of nanotechnology significantly surge rapid growth of this market. In addition, polymerization and microfabrication of semiconductor devices by CVD along with use of ALD in Dynamic RAMs and biomedical field will further augment the growth of this market. Efforts by vendors of this market in research and development of high-k metal precursors technology using ALD and CVD is expected to drive this marker for the forecast. High initial cost and complex designing techniques are major restraints of this market.
Geographically, this market has been segmented into regions such as North America, Europe, Latin America, Asia Pacific and the Middle East & Africa. The study details country-level aspects based on each segment and gives estimates in terms of market size.
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